DOI
https://doi.org/10.1007/s12633-021-01211-3
Link
https://link.springer.com/article/10.1007/s12633-021-01211-3
Year of Publication
2021
Type
Journals
Published in
Silicon
Publication Title
Design and Analysis of Triple Metal Vertical TFET Gate Stacked with N-Type SiGe Delta-Doped Layer
Status
International
First Author
Shilpi Gupta
Second Author
Subodh Wairya
Third Author
S Singh
Page Numbers
4217-4225
Status of Paper
Published
Related Department
Electronics & Communication Engineering Department
Nature
SCIE
Publisher
Springer Journals Publication
Refereed/Peer Reviewed
Peer Reviewed
Month of Publication
Jun